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Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films

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Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films

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dc.contributor.author Reyes Tolosa, María Dolores es_ES
dc.contributor.author Alajami, M. es_ES
dc.contributor.author Montero Reguera, Álvaro Enrique es_ES
dc.contributor.author Damonte, L.C. es_ES
dc.contributor.author Hernández Fenollosa, María De Los Ángeles es_ES
dc.date.accessioned 2021-02-25T04:49:19Z
dc.date.available 2021-02-25T04:49:19Z
dc.date.issued 2019-09-20 es_ES
dc.identifier.issn 2523-3963 es_ES
dc.identifier.uri http://hdl.handle.net/10251/162363
dc.description.abstract [EN] The quality and properties of electrodeposited nanostructured ZnO films are improved when they are deposited on a crystal lattice-matching substrate. To this end, a highly conductive indium tin oxide substrate is covered with an interlayer of ZnO using direct-current magnetron sputtering. In this manuscript, we describe the effect of this interlayer on the morphological and optical properties of several nanostructured ZnO films grown by different electrodeposition methods. The thickness of the ZnO interlayer was varied starting from ultrathin layers of 10 nm all the way up to 230 nm as determined by ellipsonnetry. The structural and optical properties of the nanostructured ZnO films deposited on top of these interlayers were characterized using field emission scanning electron microscopy (FESEM), atomic force microscopy and UV-visible spectroscopy. Optimum properties of the nanostructured ZnO films for application in thin-film optoelectronic devices are obtained when the ZnO interlayer has a thickness of approximately 45 nm. This is the case for all the electrodeposition methods used in this work. es_ES
dc.language Inglés es_ES
dc.publisher Springer es_ES
dc.relation.ispartof SN Applied Sciences es_ES
dc.rights Reconocimiento (by) es_ES
dc.subject ZnO films es_ES
dc.subject Electrodeposition es_ES
dc.subject DC magnetron sputtering es_ES
dc.subject Optical properties es_ES
dc.subject Nanostructures es_ES
dc.subject Band gap energy es_ES
dc.subject.classification MAQUINAS Y MOTORES TERMICOS es_ES
dc.subject.classification FISICA APLICADA es_ES
dc.subject.classification CIENCIA DE LOS MATERIALES E INGENIERIA METALURGICA es_ES
dc.title Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films es_ES
dc.type Artículo es_ES
dc.identifier.doi 10.1007/s42452-019-1293-7 es_ES
dc.relation.projectID info:eu-repo/grantAgreement/MINECO//IEDI-2016-00706/ES/IEDI-2016-00706/ es_ES
dc.rights.accessRights Abierto es_ES
dc.contributor.affiliation Universitat Politècnica de València. Departamento de Termodinámica Aplicada - Departament de Termodinàmica Aplicada es_ES
dc.contributor.affiliation Universitat Politècnica de València. Departamento de Ingeniería Mecánica y de Materiales - Departament d'Enginyeria Mecànica i de Materials es_ES
dc.contributor.affiliation Universitat Politècnica de València. Departamento de Física Aplicada - Departament de Física Aplicada es_ES
dc.contributor.affiliation Universitat Politècnica de València. Instituto Interuniversitario de Investigación en Bioingeniería y Tecnología Orientada al Ser Humano - Institut Interuniversitari d'Investigació en Bioenginyeria i Tecnologia Orientada a l'Ésser Humà es_ES
dc.description.bibliographicCitation Reyes Tolosa, MD.; Alajami, M.; Montero Reguera, ÁE.; Damonte, L.; Hernández Fenollosa, MDLÁ. (2019). Influence of seed layer thickness on properties of electrodeposited ZnO nanostructured films. SN Applied Sciences. 1(10):1-9. https://doi.org/10.1007/s42452-019-1293-7 es_ES
dc.description.accrualMethod S es_ES
dc.relation.publisherversion https://doi.org/10.1007/s42452-019-1293-7 es_ES
dc.description.upvformatpinicio 1 es_ES
dc.description.upvformatpfin 9 es_ES
dc.type.version info:eu-repo/semantics/publishedVersion es_ES
dc.description.volume 1 es_ES
dc.description.issue 10 es_ES
dc.relation.pasarela S\394733 es_ES
dc.contributor.funder Ministerio de Economía y Competitividad es_ES
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