Pauly, SteffenSchulz, AndreasWalker, MatthiasGorath, K.Baumgärtner, KlausTovar, Günter2019-11-042019-11-042019-10-159788490487198https://riunet.upv.es/handle/10251/130169[EN] The aim of this study is to investigate and to optimize an existing microwave-powered remote plasma source (RPS) with respect to the etching rate and gas temperature and to simplify the setup to save production costs. To achieve these goals, a FEM-based model of the RPS has been developed in order to investigate the microwave coupling into the plasma chamber and the microwave field distribution as well as the plasma itself. Different examples of FEM-based microwave simulations at different conditions and their experimental validations will be presented.8Reconocimiento - No comercial - Sin obra derivada (by-nc-nd)Energy Production by MicrowavesMicrowave CVDEM ModellingMicrowave Material interactionDielectric PropertiesDielectric Properties MeasurementSolid State MicrowaveMicrowave ProcessingMicrowave ChemistryMicrowave applicators designMicrowave plasmaRemote plasma sourceModelingPlasma etchingCapítulo de libro10.4995/AMPERE2019.2019.9757Abierto