Ortega Higueruelo, Francisco José; Bañuls Polo, María-José; Sanza, Francisco J.; Laguna, Mari Fe; Holgado Bolaños, Miguel; Casquel Del Campo, Rafael; Angulo Barrios, Carlos; López Romero, David; Maquieira Catala, Ángel; Puchades, Rosa(Royal Society of Chemistry, 2013)
[EN] The negative epoxy-based SU-8 photoresist has a wide variety of applications within the semiconductor industry, photonics and lab-on-a-chip devices, and it is emerging as an alternative to silicon-based devices for ...
Casquel, R.; Soler, J. A.; Holgado, M.; Lopez, A.; Lavin, A.; de Vicente, J.; Sanza, F. J.; Laguna, M. F.; Holgado Bolaños, Miguel; Bañuls Polo, María-José; Puchades, Rosa(Optical Society of America, 2015-05-18)
In this work we present an optical technique for characterizing sub-micrometric areas based on reflectivity of the light as a function of angle of incidence for the two pure polarizations s and p, covering a range of angles ...