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A CMOS Compatible Silicon-on-Insulator Polarization Rotator Based on Symmetry Breaking of the Waveguide Cross Section

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A CMOS Compatible Silicon-on-Insulator Polarization Rotator Based on Symmetry Breaking of the Waveguide Cross Section

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dc.contributor.author Aamer, Mariam es_ES
dc.contributor.author Gutiérrez Campo, Ana María es_ES
dc.contributor.author Brimont, Antoine Christian Jacques es_ES
dc.contributor.author Vermeulen, Diedrik es_ES
dc.contributor.author Roelkens, Gunther es_ES
dc.contributor.author Fedeli, Jean-Marc es_ES
dc.contributor.author Håkansson, Ola Andreas es_ES
dc.contributor.author Sanchis Kilders, Pablo es_ES
dc.date.accessioned 2014-06-10T15:19:09Z
dc.date.issued 2012-11-15
dc.identifier.issn 1041-1135
dc.identifier.uri http://hdl.handle.net/10251/38055
dc.description.abstract [EN] A polarization rotator in silicon-on-insulator technology based on breaking the symmetry of the waveguide cross section is reported. The 25-mu m-long device is designed to be integrated with standard grating couplers without the need for extra fabrication steps. Hence, fabrication is carried out by a 2-etch-step complementary metal-oxide-semiconductor compatible process using 193-nm deep ultraviolet lithography. A polarization conversion efficiency of more than -0.85 dB with insertion losses ranging from -1 to -2.5 dB over a wavelength range of 30 nm is demonstrated. © 1989-2012 IEEE es_ES
dc.description.sponsorship This work was supported by the European Commission under Project HELIOS (pHotonics Electronics functional Integration on CMOS), FP7-224312, TEC2008-06333 SINADEC and PROMETEO-2010-087 R&D Excellency Program (NANOMET). en_EN
dc.format.extent 4 es_ES
dc.language Inglés es_ES
dc.publisher Institute of Electrical and Electronics Engineers (IEEE) es_ES
dc.relation.ispartof IEEE Photonics Technology Letters es_ES
dc.rights Reserva de todos los derechos es_ES
dc.subject Integrated optics es_ES
dc.subject Polarization rotator es_ES
dc.subject Silicon-on-insulator (SOI) es_ES
dc.subject CMOS Compatible es_ES
dc.subject Compatible process es_ES
dc.subject Complementary metal oxide semiconductors es_ES
dc.subject Deep ultraviolet lithography es_ES
dc.subject Grating couplers es_ES
dc.subject Polarization conversion es_ES
dc.subject Silicon on insulator es_ES
dc.subject Silicon-on-insulators es_ES
dc.subject Siliconon-insulator technology (SOI) es_ES
dc.subject Symmetry-breaking es_ES
dc.subject Waveguide cross section es_ES
dc.subject Wavelength ranges es_ES
dc.subject Circular waveguides es_ES
dc.subject Conversion efficiency es_ES
dc.subject Automobile manufacture es_ES
dc.subject.classification TEORIA DE LA SEÑAL Y COMUNICACIONES es_ES
dc.title A CMOS Compatible Silicon-on-Insulator Polarization Rotator Based on Symmetry Breaking of the Waveguide Cross Section es_ES
dc.type Artículo es_ES
dc.embargo.lift 10000-01-01
dc.embargo.terms forever es_ES
dc.identifier.doi 10.1109/LPT.2012.2218593
dc.relation.projectID info:eu-repo/grantAgreement/EC/FP7/224312/EU/pHotonics ELectronics functional Integration on CMOS/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/MICINN//TEC2008-06333/ES/DISPOSITIVOS NANOFOTONICOS EN SILICIO/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/GVA//PROMETEO%2F2010%2F087/ES/DESARROLLO DE NUEVOS DISPOSITIVOS NANOFOTONICOS BASADOS EN GUIAS DE SILICIO Y METAMATERIALES/
dc.rights.accessRights Abierto es_ES
dc.contributor.affiliation Universitat Politècnica de València. Instituto Universitario de Tecnología Nanofotónica - Institut Universitari de Tecnologia Nanofotònica es_ES
dc.contributor.affiliation Universitat Politècnica de València. Departamento de Comunicaciones - Departament de Comunicacions es_ES
dc.description.bibliographicCitation Aamer, M.; Gutiérrez Campo, AM.; Brimont, ACJ.; Vermeulen, D.; Roelkens, G.; Fedeli, J.; Håkansson, OA.... (2012). A CMOS Compatible Silicon-on-Insulator Polarization Rotator Based on Symmetry Breaking of the Waveguide Cross Section. IEEE Photonics Technology Letters. 24(22):2031-2034. https://doi.org/10.1109/LPT.2012.2218593 es_ES
dc.description.accrualMethod S es_ES
dc.relation.publisherversion http://dx.doi.org/10.1109/LPT.2012.2218593 es_ES
dc.description.upvformatpinicio 2031 es_ES
dc.description.upvformatpfin 2034 es_ES
dc.type.version info:eu-repo/semantics/publishedVersion es_ES
dc.description.volume 24 es_ES
dc.description.issue 22 es_ES
dc.relation.senia 230601
dc.contributor.funder European Commission
dc.contributor.funder Ministerio de Ciencia e Innovación
dc.contributor.funder Generalitat Valenciana


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