Modelling and Study of a Microwave Plasma Source for High-rate Etching

Vista sencilla de ítem
dc.contributor.authorPauly, Steffenes_ES
dc.contributor.authorSchulz, Andreases_ES
dc.contributor.authorWalker, Matthiases_ES
dc.contributor.authorGorath, K.es_ES
dc.contributor.authorBaumgärtner, Klauses_ES
dc.contributor.authorTovar, Günteres_ES
dc.date.accessioned2019-11-04T08:35:09Z
dc.date.available2019-11-04T08:35:09Z
dc.date.issued2019-10-15
dc.description.abstract[EN] The aim of this study is to investigate and to optimize an existing microwave-powered remote plasma source (RPS) with respect to the etching rate and gas temperature and to simplify the setup to save production costs. To achieve these goals, a FEM-based model of the RPS has been developed in order to investigate the microwave coupling into the plasma chamber and the microwave field distribution as well as the plasma itself. Different examples of FEM-based microwave simulations at different conditions and their experimental validations will be presented.en_EN
dc.description.accrualMethodOCSes_ES
dc.description.bibliographicCitationPauly, S.; Schulz, A.; Walker, M.; Gorath, K.; Baumgärtner, K.; Tovar, G. (2019). Modelling and Study of a Microwave Plasma Source for High-rate Etching. En AMPERE 2019. 17th International Conference on Microwave and High Frequency Heating. Editorial Universitat Politècnica de València. 35-42. https://doi.org/10.4995/AMPERE2019.2019.9757es_ES
dc.description.upvformatpfin42es_ES
dc.description.upvformatpinicio35es_ES
dc.format.extent8es_ES
dc.identifier.doi10.4995/AMPERE2019.2019.9757
dc.identifier.isbn9788490487198
dc.identifier.urihttps://riunet.upv.es/handle/10251/130169
dc.languageIngléses_ES
dc.publisherEditorial Universitat Politècnica de Valènciaes_ES
dc.relation.conferencedateSeptiembre 09-12, 2019es_ES
dc.relation.conferencenameAmpere 2019es_ES
dc.relation.conferenceplaceValencia, Spaines_ES
dc.relation.ispartofAMPERE 2019. 17th International Conference on Microwave and High Frequency Heatinges_ES
dc.relation.pasarelaOCS\9757es_ES
dc.relation.publisherversionhttp://ocs.editorial.upv.es/index.php/AMPERE2019/AMPERE2019/paper/view/9757es_ES
dc.rightsReconocimiento - No comercial - Sin obra derivada (by-nc-nd)es_ES
dc.rights.accessRightsAbiertoes_ES
dc.subjectEnergy Production by Microwaveses_ES
dc.subjectMicrowave CVDes_ES
dc.subjectEM Modellinges_ES
dc.subjectMicrowave Material interactiones_ES
dc.subjectDielectric Propertieses_ES
dc.subjectDielectric Properties Measurementes_ES
dc.subjectSolid State Microwavees_ES
dc.subjectMicrowave Processinges_ES
dc.subjectMicrowave Chemistryes_ES
dc.subjectMicrowave applicators designes_ES
dc.subjectMicrowave plasmaes_ES
dc.subjectRemote plasma sourcees_ES
dc.subjectModelinges_ES
dc.subjectPlasma etchinges_ES
dc.titleModelling and Study of a Microwave Plasma Source for High-rate Etchinges_ES
dc.typeCapítulo de libroes_ES
dc.typeComunicación en congresoes_ES
dc.type.versioninfo:eu-repo/semantics/publishedVersiones_ES
dspace.entity.typePublication
upv.uuid8a9d18fc-b2b6-49e8-816b-be6bbc1456c9es_ES

Archivos

Bloque original

Mostrando 1 - 1 de 1
Miniatura
Nombre:
Pauly;Schulz;Walker - Modelling and Study of a Microwave Plasma Source for High-rate Etching.pdf
Tamaño:
2.28 MB
Formato:
Adobe Portable Document Format
Descripción:
Versión editorial
[object Object] Descargar

Colecciones

Ampere 2019