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Martín-Sánchez, D.; Kovylina, M.; Ponce-Alcántara, S.; García-Rupérez, J. (2019). Thermo-optic coefficient of porous silicon in the infrared region and oxidation process at low temperatures. Journal of The Electrochemical Society. 166(6):B355-B359. https://doi.org/10.1149/2.0341906jes
Por favor, use este identificador para citar o enlazar este ítem: http://hdl.handle.net/10251/140878
Título: | Thermo-optic coefficient of porous silicon in the infrared region and oxidation process at low temperatures | |
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[EN] In this work, a porous silicon nanostructure has been fabricated by electrochemical means and used as a thermal sensor. The thermo-optic effect in the near infrared region has been experimentally studied based on ...[+]
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Derechos de uso: | Reconocimiento (by) | |
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Versión del editor: | https://doi.org/10.1149/2.0341906jes | |
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