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Memory kernel formalism with fractional exponents and its application to dielectric relaxation

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Memory kernel formalism with fractional exponents and its application to dielectric relaxation

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dc.contributor.author Hernández, S. I. es_ES
dc.contributor.author del Castillo, L.F. es_ES
dc.contributor.author del Castillo, Roxana M. es_ES
dc.contributor.author Garcia-Bernabe, Abel es_ES
dc.contributor.author Compañ Moreno, Vicente es_ES
dc.date.accessioned 2024-01-31T19:02:45Z
dc.date.available 2024-01-31T19:02:45Z
dc.date.issued 2023-02-15 es_ES
dc.identifier.issn 0378-4371 es_ES
dc.identifier.uri http://hdl.handle.net/10251/202273
dc.description.abstract [EN] A fractal Fokker-Planck formalism applied to the dielectric relaxation in glass forming liquids is proposed. This formalism is a modality of the generalized equation of Langevin on the use of fractional-time derivatives simultaneously with the memory function to describe the dynamics of the dipolar-moment autocorrelation function. The goal is to get the description of the complex autocorrelation function numerically, and the real and imaginary parts of the second-order memory function, related to the kernel of the integral hierarchy representation of this autocorrelation function. The results exhibit the memory effect associates with alpha-dielectric relaxation mode. From the analysis, it is shown the existence of a maximum and the appropriated frequency limit in the imaginary and real parts, respectively, of the second-order memory function. That is required to describe experimental well the complex shear viscosity of the material.The theoretical model was tested with experimental data from dielectric spec-troscopy of biphenyl-2-yl isobutyrate (OBPI), a glass forming liquid, in measurements in the frequency domain from 10-2 to 106 Hz. This ester has been selected in this study for its predominant alpha-relaxation when compared to the beta relaxation. The real and imaginary parts of the second-order memory function were evaluated by means of the proposed model and the aid of the parameters of the Havriliak-Negami relationship. es_ES
dc.description.sponsorship The authors wish to state, posthumously, the excellent research carried out by Prof. Luis F. Del Castillo in the field of the memory effect associated with polymeric materials. On the other hand, we thank Professor Niels Boye Olsen and Jeppe C. Dyre from Roskilde University (Denmark) for dielectric measurements. AG -B and VC gratefully acknowledge to Ministerio de Economia y Competitividad (MINECO) , Spain for financial support by the ENE/2015-69203-R project. AG -B thanks Vicerrectorado de Investigacion de la Universitat Politecnica de Valencia, Spain for the financing of the Project (PAID -11-21) . SIH is grateful to projects UNAM-DGAPA-PAPIIT IN114721, LANCAD-UNAM-DGTIC-276 and appreciate the technical support of Alejandro de Leon Cuevas, Alejandro Avalos and Luis Alberto Aguilar Bautista from Laboratorio Nacional de Visualizacion Cientifica Avanzada (LAVIS-UNAM) , and Beatriz Marcela Millan Malo from CFATA-UNAM. RMdC is grateful to projects LANCAD-UNAM-DGTIC-385 and UNAM-DGAPA-PAPIIT IN120120. LFdC is grateful to projects UNAM- DGAPA-PAPIIT IG-100618 and IN 114818, and also thanks to Raul Reyes Ortiz and Alberto Lopez Vivas for technical assistance. es_ES
dc.language Inglés es_ES
dc.publisher Elsevier es_ES
dc.relation.ispartof Physica A Statistical Mechanics and its Applications es_ES
dc.rights Reconocimiento - No comercial - Sin obra derivada (by-nc-nd) es_ES
dc.subject Second-order memory function (SOMF) es_ES
dc.subject Biphenyl-2-yl isobutyrate (OBPI) es_ES
dc.subject Dielectric relaxation es_ES
dc.subject Autocorrelation function es_ES
dc.subject Havriliak-Negami relaxation time es_ES
dc.subject.classification MAQUINAS Y MOTORES TERMICOS es_ES
dc.title Memory kernel formalism with fractional exponents and its application to dielectric relaxation es_ES
dc.type Artículo es_ES
dc.identifier.doi 10.1016/j.physa.2023.128486 es_ES
dc.relation.projectID info:eu-repo/grantAgreement/MINECO//ENE2015-69203-R/ES/DESARROLLO Y EVALUACION DE NUEVAS MEMBRANAS POLIMERICAS REFORZADAS CON NANOFIBRAS PARA SU APLICACION EN PILAS DE COMBUSTIBLE CON ELEVADA ESTABILIDAD TERMICA/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/UPV-VIN//AYUDA PAID-11-21//Desarrollo, modelado y construcción de un Stack de pila de combustible polimérica a temperaturas moderadas para oeciueño vehículo terrestre/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/UNAM//LANCAD-UNAM-DGTIC-385/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/UNAM//IN120120/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/UNAM//IN114818/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/UNAM//LANCAD-UNAM-DGTIC-276/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/UNAM//IG 100618/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/UNAM//IN114721/ es_ES
dc.rights.accessRights Embargado es_ES
dc.date.embargoEndDate 2025-02-15 es_ES
dc.contributor.affiliation Universitat Politècnica de València. Escuela Técnica Superior de Ingenieros Industriales - Escola Tècnica Superior d'Enginyers Industrials es_ES
dc.description.bibliographicCitation Hernández, SI.; Del Castillo, L.; Del Castillo, RM.; Garcia-Bernabe, A.; Compañ Moreno, V. (2023). Memory kernel formalism with fractional exponents and its application to dielectric relaxation. Physica A Statistical Mechanics and its Applications. 612. https://doi.org/10.1016/j.physa.2023.128486 es_ES
dc.description.accrualMethod S es_ES
dc.relation.publisherversion https://doi.org/10.1016/j.physa.2023.128486 es_ES
dc.type.version info:eu-repo/semantics/publishedVersion es_ES
dc.description.volume 612 es_ES
dc.relation.pasarela S\498946 es_ES
dc.contributor.funder UNIVERSIDAD POLITECNICA DE VALENCIA es_ES
dc.contributor.funder Universidad Nacional Autónoma de México es_ES
dc.contributor.funder MINISTERIO DE ASUNTOS ECONOMICOS Y TRANSFORMACION DIGITAL es_ES


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