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Using patterns to design technology-enhancedlearning scenarios

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Using patterns to design technology-enhancedlearning scenarios

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dc.contributor.author Buendía García, Félix es_ES
dc.contributor.author Benlloch-Dualde, José Vicente es_ES
dc.date.accessioned 2013-06-12T12:21:04Z
dc.date.available 2013-06-12T12:21:04Z
dc.date.issued 2011
dc.identifier.issn 1887-1542
dc.identifier.uri http://hdl.handle.net/10251/29658
dc.description.abstract [EN] Research on designing for learning is a field that has concentrated a lot of efforts in the context of technology-enhanced settings. This fact has demonstrated the need to represent learning scenarios using a more formal perspective. This paper reviews some representation mechanisms which enable the systematic design of learning issues in technological settings, and proposes an approach that applies pattern notations in an effort to better understand and prepare for different learning context. A case study is also described to show the application of these scenarios in a specific technology-enhanced setting for teaching computing curricula. This application is based on the use of digital ink technologies and demonstrates how patterns may be able to mediate between pedagogical and technical issues. es_ES
dc.language Inglés es_ES
dc.publisher Comisión Europea es_ES
dc.relation.ispartof eLearning Papers es_ES
dc.rights Reconocimiento - No comercial - Sin obra derivada (by-nc-nd) es_ES
dc.subject Technology-enhanced setting es_ES
dc.subject Learning scenario es_ES
dc.subject Design patterns es_ES
dc.subject Digital-ink technologies es_ES
dc.subject.classification ARQUITECTURA Y TECNOLOGIA DE COMPUTADORES es_ES
dc.title Using patterns to design technology-enhancedlearning scenarios es_ES
dc.type Artículo es_ES
dc.rights.accessRights Abierto es_ES
dc.contributor.affiliation Universitat Politècnica de València. Departamento de Informática de Sistemas y Computadores - Departament d'Informàtica de Sistemes i Computadors es_ES
dc.description.bibliographicCitation Buendía García, F.; Benlloch-Dualde, JV. (2011). Using patterns to design technology-enhancedlearning scenarios. eLearning Papers. (27):1-12. http://hdl.handle.net/10251/29658 es_ES
dc.description.accrualMethod S es_ES
dc.relation.publisherversion http://www.elearningpapers.eu/sites/default/files/asset/In-depth_27_2.pdf es_ES
dc.description.upvformatpinicio 1 es_ES
dc.description.upvformatpfin 12 es_ES
dc.type.version info:eu-repo/semantics/publishedVersion es_ES
dc.description.issue 27 es_ES
dc.relation.senia 212470


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