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dc.contributor.author | Buendía García, Félix![]() |
es_ES |
dc.contributor.author | Benlloch-Dualde, José Vicente![]() |
es_ES |
dc.date.accessioned | 2013-06-12T12:21:04Z | |
dc.date.available | 2013-06-12T12:21:04Z | |
dc.date.issued | 2011 | |
dc.identifier.issn | 1887-1542 | |
dc.identifier.uri | http://hdl.handle.net/10251/29658 | |
dc.description.abstract | [EN] Research on designing for learning is a field that has concentrated a lot of efforts in the context of technology-enhanced settings. This fact has demonstrated the need to represent learning scenarios using a more formal perspective. This paper reviews some representation mechanisms which enable the systematic design of learning issues in technological settings, and proposes an approach that applies pattern notations in an effort to better understand and prepare for different learning context. A case study is also described to show the application of these scenarios in a specific technology-enhanced setting for teaching computing curricula. This application is based on the use of digital ink technologies and demonstrates how patterns may be able to mediate between pedagogical and technical issues. | es_ES |
dc.language | Inglés | es_ES |
dc.publisher | Comisión Europea | es_ES |
dc.relation.ispartof | eLearning Papers | es_ES |
dc.rights | Reconocimiento - No comercial - Sin obra derivada (by-nc-nd) | es_ES |
dc.subject | Technology-enhanced setting | es_ES |
dc.subject | Learning scenario | es_ES |
dc.subject | Design patterns | es_ES |
dc.subject | Digital-ink technologies | es_ES |
dc.subject.classification | ARQUITECTURA Y TECNOLOGIA DE COMPUTADORES | es_ES |
dc.title | Using patterns to design technology-enhancedlearning scenarios | es_ES |
dc.type | Artículo | es_ES |
dc.rights.accessRights | Abierto | es_ES |
dc.contributor.affiliation | Universitat Politècnica de València. Departamento de Informática de Sistemas y Computadores - Departament d'Informàtica de Sistemes i Computadors | es_ES |
dc.description.bibliographicCitation | Buendía García, F.; Benlloch-Dualde, JV. (2011). Using patterns to design technology-enhancedlearning scenarios. eLearning Papers. (27):1-12. http://hdl.handle.net/10251/29658 | es_ES |
dc.description.accrualMethod | S | es_ES |
dc.relation.publisherversion | http://www.elearningpapers.eu/sites/default/files/asset/In-depth_27_2.pdf | es_ES |
dc.description.upvformatpinicio | 1 | es_ES |
dc.description.upvformatpfin | 12 | es_ES |
dc.type.version | info:eu-repo/semantics/publishedVersion | es_ES |
dc.description.issue | 27 | es_ES |
dc.relation.senia | 212470 |