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Optical gating of photosensitive synthetic ion channels

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Optical gating of photosensitive synthetic ion channels

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Ali, M.; Nasir, S.; Ramirez Hoyos, P.; Ahmed, I.; Nguyen, QH.; Fruk, L.; Mafe, S.... (2012). Optical gating of photosensitive synthetic ion channels. Advanced Functional Materials. 22:390-396. https://doi.org/10.1002/adfm.201102146

Por favor, use este identificador para citar o enlazar este ítem: http://hdl.handle.net/10251/29908

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Title: Optical gating of photosensitive synthetic ion channels
Author: Ali, Mubarak Nasir, Saima Ramirez Hoyos, Patricio Ahmed, Ishtiaq Nguyen, Quoc Hung Fruk, Ljiljana Mafe, Salvador Ensinger, Wolfgang
UPV Unit: Universitat Politècnica de València. Departamento de Física Aplicada - Departament de Física Aplicada
Issued date:
Abstract:
4-oxo-4-(pyren-4-ylmethoxy) butanoic acid is used as a photolabile protecting group to show the optical gating of nanofluidic devices based on synthetic ion channels. The inner surface of the channels is decorated with ...[+]
Subjects: Current rectification , Optical gating , Photosensitive nanostructures , Polymer membranes , Synthetic ion channels , Controlled release , Current voltage , Hydrophilic groups , Hydrophobic molecules , Inner surfaces , Ionic species , Ionic transports , Multi-channel , Multifunctional devices , Nano channels , Nano-fluidic devices , Optical gatings , Photolabile protecting groups , Selective permeation , UV-light irradiation , Data processing , Functional polymers , Hydrophilicity , Hydrophobicity , Irradiation , Light sensitive materials , Monolayers , Nanostructures , Photosensitivity , Polymeric membranes , Ions
Copyrigths: Cerrado
Source:
Advanced Functional Materials. (issn: 1616-301X )
DOI: 10.1002/adfm.201102146
Publisher:
Wiley-VCH Verlag
Publisher version: http://onlinelibrary.wiley.com/doi/10.1002/adfm.201102146/full
Project ID:
Beilstein-Institut, Frankfurt/Main, Germany
Ministry of Science and Innovation of Spain FEDER
info:eu-repo/grantAgreement/MICINN//MAT2009-07747/ES/Fenomenos De Transporte En Nanoporos Sinteticos Con Nuevas Propiedades Funcionales: Diseño De Nuevos Procesos/
KIT Excellence Initiative [A5.7]
Thanks:
M.A., S.N., Q.H.N., and W. E. gratefully acknowledge financial support by the Beilstein-Institut, Frankfurt/Main, Germany, within the research collaboration NanoBiC. P. R. and S. M. acknowledge the financial support from ...[+]
Type: Artículo

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