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Electrochemical Deposition Mechanism for ZnO Nanorods: Diffusion Coefficient and Growth Models

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Electrochemical Deposition Mechanism for ZnO Nanorods: Diffusion Coefficient and Growth Models

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Reyes Tolosa, MD.; Orozco Messana, J.; Lima, A.; Camaratta, R.; Pascual Guillamón, M.; Hernández Fenollosa, MDLÁ. (2011). Electrochemical Deposition Mechanism for ZnO Nanorods: Diffusion Coefficient and Growth Models. Journal of The Electrochemical Society. 158(11):107-110. doi:10.1149/0.020111jes

Por favor, use este identificador para citar o enlazar este ítem: http://hdl.handle.net/10251/31973

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Title: Electrochemical Deposition Mechanism for ZnO Nanorods: Diffusion Coefficient and Growth Models
Author: Reyes Tolosa, María Dolores Orozco Messana, Javier Lima, A.N.C. Camaratta, Rubens Pascual Guillamón, Manuel Hernández Fenollosa, María de los Ángeles
UPV Unit: Universitat Politècnica de València. Departamento de Ingeniería Mecánica y de Materiales - Departament d'Enginyeria Mecànica i de Materials
Universitat Politècnica de València. Departamento de Física Aplicada - Departament de Física Aplicada
Issued date:
Abstract:
Fabrication of nanostructured ZnO thin films is a critical process for many applications based on semiconductor devices. So on understanding of the electrochemical deposition mechanism is also fundamental for knowing the ...[+]
Subjects: Optical-Properties , Cathodic Electrodeposition , Zinc-Oxide , Thin-Films , Semiconductors
Copyrigths: Reserva de todos los derechos
Source:
Journal of The Electrochemical Society. (issn: 0013-4651 )
DOI: 10.1149/0.020111jes
Publisher:
Electrochemical Society
Type: Artículo

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