- -

Pulse and potentiostatic electrodeposition of CuInSe2 films on gold coated alumina substrates

RiuNet: Repositorio Institucional de la Universidad Politécnica de Valencia

Compartir/Enviar a

Citas

Estadísticas

  • Estadisticas de Uso

Pulse and potentiostatic electrodeposition of CuInSe2 films on gold coated alumina substrates

Mostrar el registro sencillo del ítem

Ficheros en el ítem

dc.contributor.author Valdés, M. es_ES
dc.contributor.author Mollar García, Miguel Alfonso es_ES
dc.contributor.author Vazquéz, M. es_ES
dc.contributor.author Marí Soucase, Bernabé es_ES
dc.date.accessioned 2015-02-26T10:59:55Z
dc.date.available 2015-02-26T10:59:55Z
dc.date.issued 2013-06
dc.identifier.issn 0021-891X
dc.identifier.uri http://hdl.handle.net/10251/47502
dc.description.abstract [EN] CuInSe2 thin films were deposited on goldcoated alumina electrodes using constant and pulsed potential signals. In situ electrochemical measurements were recorded with an atomic force microscope to follow CuInSe2 electrodeposition. The electrodeposited films were characterized employing scanning electron microscopy, energy dispersive spectroscopy, grazing incidence X-ray diffraction, and Raman spectroscopy. The best stoichiometry is attained for films deposited at pulsed potentials of -0.7 V. These films are also the most compact, showing a homogeneous morphology. In contrast, potentiostatic films presented minor variations in their chemical composition with the deposition potential. The morphology presented porous coral-like structures. X-ray and Raman spectroscopy analysis of as-deposited films by either technique reveal the presence of secondary phases such as CuxSe and Se, especially at the most positive deposition potentials. After a thermal treatment at 500 "C in Se vapor, the crystallinity of the material is significantly enhanced and no secondary phases are present. es_ES
dc.description.sponsorship This study was partially supported by Spanish Government through MCINN grant MAT2009-14625-C03-03 and European Commission through NanoCIS project FP7-PEOPLE-2010IRSES (ref. 269279). Financial support from Consejo Nacional de Investigaciones Cientificas y Tecnicas (CONICET), Agencia Nacional de Promocion Cientifica y Tecnologica and Universidad Nacional de Mar del Plata (UNMdP) from Argentina are greatly acknowledged. The authors wish to thank BSc. Mariela Desimone for her assistance with GXRD measurements. en_EN
dc.language Inglés es_ES
dc.publisher Springer Verlag (Germany) es_ES
dc.relation.ispartof Journal of Applied Electrochemistry es_ES
dc.rights Reserva de todos los derechos es_ES
dc.subject CuInSe2 es_ES
dc.subject Semiconductor es_ES
dc.subject Thin films es_ES
dc.subject Electrodeposition es_ES
dc.subject AFM es_ES
dc.subject.classification FISICA APLICADA es_ES
dc.title Pulse and potentiostatic electrodeposition of CuInSe2 films on gold coated alumina substrates es_ES
dc.type Artículo es_ES
dc.identifier.doi 10.1007/s10800-013-0549-y
dc.relation.projectID info:eu-repo/grantAgreement/MICINN//MAT2009-14625-C03-03/ES/Diseño, Sintesis Y Caracterizacion De Materiales Fotovoltaicos Avanzados De Alta Eficiencia/ es_ES
dc.relation.projectID info:eu-repo/grantAgreement/EC/FP7/269279/EU/Development of a new generation of CIGS-based solar cells/
dc.rights.accessRights Cerrado es_ES
dc.contributor.affiliation Universitat Politècnica de València. Departamento de Física Aplicada - Departament de Física Aplicada es_ES
dc.description.bibliographicCitation Valdés, M.; Mollar García, MA.; Vazquéz, M.; Marí Soucase, B. (2013). Pulse and potentiostatic electrodeposition of CuInSe2 films on gold coated alumina substrates. Journal of Applied Electrochemistry. 43(6):619-628. https://doi.org/10.1007/s10800-013-0549-y es_ES
dc.description.accrualMethod S es_ES
dc.relation.publisherversion http://dx.doi.org/10.1007/s10800-013-0549-y es_ES
dc.description.upvformatpinicio 619 es_ES
dc.description.upvformatpfin 628 es_ES
dc.type.version info:eu-repo/semantics/publishedVersion es_ES
dc.description.volume 43 es_ES
dc.description.issue 6 es_ES
dc.relation.senia 263950
dc.contributor.funder Ministerio de Ciencia e Innovación
dc.contributor.funder Consejo Nacional de Investigaciones Científicas y Técnicas, Argentina
dc.contributor.funder Agencia Nacional de Promoción Científica y Tecnológica, Argentina
dc.contributor.funder Universidad Nacional de Mar del Plata, Argentina
dc.contributor.funder European Commission
dc.description.references Hibberd CJ, Chassaing E, Liu W et al (2010) Prog Photovolt Res Appl 18:434–452 es_ES
dc.description.references Paunovic M, Schlesinger M (2006) Fundamentals of electrochemical deposition. The electrochemical society series. Wiley, Hoboken, New Jersey es_ES
dc.description.references Lincot D, Guillemoles JF, Taunier S et al (2004) Sol Energy 77(6):725–737 es_ES
dc.description.references Arnulf J-W (2011) Sol Energy Mater Sol Cells 95(6):1509–1517 es_ES
dc.description.references Whang TJ, Hsieh MT, Kao YC (2010) Appl Surf Sci 257(5):1457–1462 es_ES
dc.description.references Hung P-K, Kuo T-W, Huang K-C et al (2012) Appl Surf Sci 258(18):7238–7243 es_ES
dc.description.references Pandey RK, Sahu SN, Chanda S (1996) Handbook of semiconductor electrodeposition. Marcel Dekker, New York es_ES
dc.description.references Mishra KK, Rajeshwar K (1989) J Electroanal Chem 271(1–2):279–294 es_ES
dc.description.references Oliveira MCF, Azevedo M, Cunha A (2002) Thin Solid Films 405:129–134 es_ES
dc.description.references Kois J, Bereznev S, Mellikov E et al (2006) Thin Solid Films 511–512:420–424 es_ES
dc.description.references Ren T, Yu R, Zhong M et al (2011) Sol Energy Mater Sol Cells 95(2):510–520 es_ES
dc.description.references Caballero-Briones F, Palacios-Padrós A, Sanz F (2011) Electrochim Acta 56(26):9556–9567 es_ES
dc.description.references Hu SY, Lee WH, Chang SC et al (2011) J Electrochem Soc 158(5):B557–B561 es_ES
dc.description.references Valdés MH, Vázquez M (2011) Electrochim Acta 56(19):6866–6873 es_ES
dc.description.references Valdés M, Vázquez M (2012) J Solid State Electrochem 16:3825–3835 es_ES
dc.description.references Kelley V, Serry M (2003) Electrochemical scanning probe microscopy manual version 5.30a. Veeco Instruments Inc. http://www.veeco.com/pdfs/user_Manuals/ElectroChemicalSPMB.pdf . Accessed 23 May 2003 es_ES
dc.description.references International Centre for Diffraction Data (ICCD): Powder Diffraction File Database (1998) Newtown Square, EEUU es_ES
dc.description.references Samantilleke AP, Sahal M, Ortiz L et al (2011) Thin Solid Films 519(21):7272–7275 es_ES
dc.description.references Calixto ME, Dobson KD, McCandless BE et al (2005) Growth mechanisms of electrodeposited CuInSe2 and Cu(In,Ga)Se2 determined by cyclic voltammetry. In: Materials Research Society Symposium Proceedings, pp 431–436 es_ES
dc.description.references Breathnach M, Ahmed S, Nakahara S et al (2006) ECS Trans 1(11):25–39 es_ES
dc.description.references Alvarez AE, Salinas DR (2010) Electrochim Acta 55(11):3714–3720 es_ES
dc.description.references Chandrasekar MS, Pushpavanam M (2008) Electrochim Acta 53(8):3313–3322 es_ES
dc.description.references De Silva KTL, Priyantha WAA, Jayanetti JKDS et al (2001) Thin Solid Films 382(1–2):158–163 es_ES
dc.description.references Araujo J, Ortíz R, López-Rivera A et al (2007) J Solid State Electrochem 11(3):407–412 es_ES
dc.description.references Sene C, Calixto ME, Dobson KD et al (2008) Thin Solid Films 516(8):2188–2194 es_ES
dc.description.references Rincón C, Ramírez FJ (1992) J Appl Phys 72(9):4321–4324 es_ES
dc.description.references Izquierdo-Roca V, Pérez-Rodríguez A, Romano-Rodríguez A et al (2007) J Appl Phys 101:103517 es_ES
dc.description.references Ramdani O, Guillemoles JF, Lincot D et al (2007) Thin Solid Films 515(15 SPEC. ISS.):5909–5912 es_ES
dc.description.references Saucedo E, Ruiz CM, Chassaing E et al (2010) Thin Solid Films 518:3674–3679 es_ES
dc.description.references Park JH, Yang IS, Cho HY (1994) Appl Phys Solid Surf 58(2):125–128 es_ES


Este ítem aparece en la(s) siguiente(s) colección(ones)

Mostrar el registro sencillo del ítem