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Optoelectronics properties of TiO2:Cu thin films obtained by sol gel method

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Optoelectronics properties of TiO2:Cu thin films obtained by sol gel method

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Essalhi, Z.; Hartiti, B.; Lfakir, A.; Marí, B.; Thevenin, P. (2017). Optoelectronics properties of TiO2:Cu thin films obtained by sol gel method. Optical and Quantum Electronics. 49(9). doi:10.1007/s11082-017-1142-0

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Título: Optoelectronics properties of TiO2:Cu thin films obtained by sol gel method
Autor: Essalhi, Zineb Hartiti, Bouchaib Lfakir, Abderrazak Marí, B. Thevenin, Philippe
Entidad UPV: Universitat Politècnica de València. Departamento de Física Aplicada - Departament de Física Aplicada
Fecha difusión:
Resumen:
[EN] In this research, Cu-doped TiO2 thin films have been successfully deposited onto a glass substrate by Sol¿gel technique using dip coating method. The films were annealed at different annealing temperatures (400¿500 ...[+]
Palabras clave: Cu-doped TiO2 , Anatase , Dip coating , Optical properties
Derechos de uso: Cerrado
Fuente:
Optical and Quantum Electronics. (issn: 0306-8919 )
DOI: 10.1007/s11082-017-1142-0
Editorial:
Springer-Verlag
Versión del editor: http://doi.org/10.1007/s11082-017-1142-0
Agradecimientos:
This work has been partially supported by LGOPS Laboratory University Polytechnic University of Valencia, Spain and LMOPS Laboratory University of Lorraine France. Technical support from LMOPS and LGOPS labs is gratefully ...[+]
Tipo: Artículo

References

Balasingh, C., Abuhasan, A.: Diffraction peak broadening studies in Al2O3 (Whisker) composites. Powder Diffr. 6(1), 16–19 (1991)

Chakrabarty, B.S.: Evaluation of optical constants of wide band gap cadmium doped polypyrrole. Impact IJRET 2(3), 37–44 (2014)

Cullity, B.D.: Elements of X-ray Diffraction. Addison-Wesley Publishing Company, Reading (1978) [+]
Balasingh, C., Abuhasan, A.: Diffraction peak broadening studies in Al2O3 (Whisker) composites. Powder Diffr. 6(1), 16–19 (1991)

Chakrabarty, B.S.: Evaluation of optical constants of wide band gap cadmium doped polypyrrole. Impact IJRET 2(3), 37–44 (2014)

Cullity, B.D.: Elements of X-ray Diffraction. Addison-Wesley Publishing Company, Reading (1978)

Dhanapandian, S., Arunachalam, A.: Effect of deposition parameters on the properties of TiO2 thin films prepared by spray pyrolysis. J. Sol Gel Sci. Technol. 77, 119–135 (2016)

Elkhalidi, Z., et al.: Behavior of NiO thin films sprayed at different annealing time. Opt. Quantum Electron. 48, 427 (2016)

El-Korashy, A., et al.: Optical studies of (NH4)2SO4 single crystal in the paraelectric phase. J. Phys. Chem. Solids 64, 2141–2146 (2003)

Huang, M., Yu, S., Li, B.: Influence of preparation methods on the structure and catalytic performance of SnO2-doped TiO2 photocatalysts. Ceram. Int. 40, 13305–13312 (2014)

Jayasinghe, R.C., Perera, A.G.U.: Optical properties of nanostructured TiO2 thin films and their application as antireflection coatings on infrared detectors. Opt. Lett. 37(20), 4302–4304 (2012)

Kingery, W.D., Bowen, H.K., Uhlmann, D.R.: Introduction to Ceramic, p. 457. Wiley, New York (1976)

Li, C.P., Wang, J.F., Su, W.B.: Effect of sinter temperature on the electrical properties of TiO2 based capacitor-varistors. Mater. Lett. 57, 1400–1405 (2003)

Luis, A.M., et al.: Influence of calcination parameters on The TiO2 photocatalytic properties. Mater. Chem. Phys. 125, 20–25 (2011)

Lyson-Sypien, B., Czapla, A., Lubecka, M.: Gas sensing properties of TiO2–SnO2 nanomaterials. Sens. Actuators B 187, 445–454 (2013)

Michael, G.: Sol–gel processed TiO2 films for photovoltaic applications. J. Sol Gel. Sci. Technol. 22, 7–13 (2001)

Ogawa, H., Higuchi, T.: Growth of TiO2 thin film by reactive RF magnetron sputtering using oxygen radical. J. Alloys Compd. 449(1–2), 375–378 (2008)

Tachibana, Y., Ohsaki, H., Hayashi, A.: TiO2–X sputter for high rate deposition of TiO2. Vacuum 59, 836–843 (2000)

Tian, L., Soum-Claude, A.: Undoped TiO2 and nitrogen-doped TiO2 thin films deposited by atomic layers deposition on planar and architecture surfaces for photovoltaic applications. Vac. Surf. Films 33, 01A141 (2015)

Urbach, F.: The long-wavelength edge of photographic sensitivity and of the electronic absorption of solids. Phys. Rev. 92, 1324 (1953)

Wang, X., Zhang, D.: A novel sol–gel method for preparing favorable TiO2 thin films. Mater. Res. Express 3, 016401 (2016)

Wang, W.B., Yanguas-Gil, A., Yang, Y.: Chemical vapor deposition of TiO2 thin films from a new halogen-free precursor. J. Vac. Sci. Technol. A 32, 061502 (2014)

Yakuphanoglu, F., et al.: The determination of the optical constants of Cu (II) compound having 1-chloro-2, 3-o-cyclohexylidinepropane thin film. Opt. Commun. 239, 275–280 (2004)

Yoldas, B.E., Partlow, P.W.: Formation of broad band antireflective coatings on fused silica for high power laser applications. Thin Solid Films 129(1–2), 1–14 (1985)

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