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Experimental procurement of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples

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Experimental procurement of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples

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Gosalvez Ayuso, MA.; Pal, P.; Ferrando Jódar, N.; Hida, H.; Sato, K. (2011). Experimental procurement of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples. Journal of Micromechanics and Microengineering. 21(12):1-14. doi:10.1088/0960-1317/21/12/125007

Por favor, use este identificador para citar o enlazar este ítem: http://hdl.handle.net/10251/76646

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Título: Experimental procurement of the complete 3D etch rate distribution of Si in anisotropic etchants based on vertically micromachined wagon wheel samples
Autor:
Entidad UPV: Universitat Politècnica de València. Instituto de Instrumentación para Imagen Molecular - Institut d'Instrumentació per a Imatge Molecular
Fecha difusión:
Resumen:
This is part I of a series of two papers dedicated to the presentation of a novel, large throughput, experimental procedure to determine the three-dimensional distribution of the etch rate of silicon in a wide range of ...[+]
Derechos de uso: Cerrado
Fuente:
Journal of Micromechanics and Microengineering. (issn: 0960-1317 )
DOI: 10.1088/0960-1317/21/12/125007
Editorial:
IOP Publishing
Versión del editor: http://dx.doi.org/10.1088/0960-1317/21/12/125007
Agradecimientos:
We are greatly thankful to Dr M Tilli, Okmetic Oy, Finland, for generously donating the {1 1 0} wafers used in the experiments. We also thank Mr S Senda of the Technology Center, Nagoya University, for helpful discussions ...[+]
Tipo: Artículo

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