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Level set implementation for the simulation of anisotropic etching: application to complex MEMS micromachining

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Level set implementation for the simulation of anisotropic etching: application to complex MEMS micromachining

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Montoliu, C.; Ferrando Jódar, N.; Gosalvez Ayuso, MA.; Cerdá Boluda, J.; Colom Palero, RJ. (2013). Level set implementation for the simulation of anisotropic etching: application to complex MEMS micromachining. Journal of Micromechanics and Microengineering. 23(7). doi:10.1088/0960-1317/23/7/075017

Por favor, use este identificador para citar o enlazar este ítem: http://hdl.handle.net/10251/57067

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Title: Level set implementation for the simulation of anisotropic etching: application to complex MEMS micromachining
Author:
UPV Unit: Universitat Politècnica de València. Instituto de Instrumentación para Imagen Molecular - Institut d'Instrumentació per a Imatge Molecular
Universitat Politècnica de València. Departamento de Ingeniería Electrónica - Departament d'Enginyeria Electrònica
Issued date:
Abstract:
The use of atomistic methods, such as the continuous cellular automaton (CCA), is currently regarded as an accurate and efficient approach for the simulation of anisotropic etching in the development of micro-electro-mechanical ...[+]
Subjects: SINGLE-CRYSTAL SILICON , UNIFIED MODEL , 3-DIMENSIONAL SIMULATIONS , CELLULAR-AUTOMATON , KOH , LITHOGRAPHY , DEPOSITION , ALGORITHMS , MORPHOLOGY , EVOLUTION
Copyrigths: Reserva de todos los derechos
Source:
Journal of Micromechanics and Microengineering. (issn: 0960-1317 ) (eissn: 1361-6439 )
DOI: 10.1088/0960-1317/23/7/075017
Publisher:
IOP Publishing: Hybrid Open Access
Publisher version: http://dx.doi.org/10.1088/0960-1317/23/7/075017
Thanks:
This work has been supported by the Spanish FPI-MICINN BES-2011-045940 grant and the Ramon y Cajal Fellowship Program by the Spanish Ministry of Science and Innovation. Also, we acknowledge support by the JAE-Doc grant ...[+]
Type: Artículo

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