Modelling and Study of a Microwave Plasma Source for High-rate Etching
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https://riunet.upv.es/handle/10251/130169
Cita bibliográfica
Pauly, S.; Schulz, A.; Walker, M.; Gorath, K.; Baumgärtner, K.; Tovar, G. (2019). Modelling and Study of a Microwave Plasma Source for High-rate Etching. En AMPERE 2019. 17th International Conference on Microwave and High Frequency Heating. Editorial Universitat Politècnica de València. 35-42. https://doi.org/10.4995/AMPERE2019.2019.9757
Titulación
Resumen
[EN] The aim of this study is to investigate and to optimize an existing microwave-powered remote plasma source (RPS) with respect to the etching rate and gas temperature and to simplify the setup to save production costs. To achieve these goals, a FEM-based model of the RPS has been developed in order to investigate the microwave coupling into the plasma chamber and the microwave field distribution as well as the plasma itself. Different examples of FEM-based microwave simulations at different conditions and their experimental validations will be presented.
Palabras clave
Energy Production by Microwaves, Microwave CVD, EM Modelling, Microwave Material interaction, Dielectric Properties, Dielectric Properties Measurement, Solid State Microwave, Microwave Processing, Microwave Chemistry, Microwave applicators design, Microwave plasma, Remote plasma source, Modeling, Plasma etching
Fuente
AMPERE 2019. 17th International Conference on Microwave and High Frequency Heating isbn: 9788490487198
Editorial
Editorial Universitat Politècnica de València