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Modelling and Study of a Microwave Plasma Source for High-rate Etching

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Modelling and Study of a Microwave Plasma Source for High-rate Etching

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Pauly, S.; Schulz, A.; Walker, M.; Gorath, K.; Baumgärtner, K.; Tovar, G. (2019). Modelling and Study of a Microwave Plasma Source for High-rate Etching. En AMPERE 2019. 17th International Conference on Microwave and High Frequency Heating. Editorial Universitat Politècnica de València. 35-42. https://doi.org/10.4995/AMPERE2019.2019.9757

Por favor, use este identificador para citar o enlazar este ítem: http://hdl.handle.net/10251/130169

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Title: Modelling and Study of a Microwave Plasma Source for High-rate Etching
Author: Pauly, Steffen Schulz, Andreas Walker, Matthias Gorath, K. Baumgärtner, Klaus Tovar, Günter
Issued date:
Abstract:
[EN] The aim of this study is to investigate and to optimize an existing microwave-powered remote plasma source (RPS) with respect to the etching rate and gas temperature and to simplify the setup to save production ...[+]
Subjects: Energy Production by Microwaves , Microwave CVD , EM Modelling , Microwave Material interaction , Dielectric Properties , Dielectric Properties Measurement , Solid State Microwave , Microwave Processing , Microwave Chemistry , Microwave applicators design , Microwave plasma , Remote plasma source , Modeling , Plasma etching
Copyrigths: Reconocimiento - No comercial - Sin obra derivada (by-nc-nd)
ISBN: 9788490487198
Source:
AMPERE 2019. 17th International Conference on Microwave and High Frequency Heating.
DOI: 10.4995/AMPERE2019.2019.9757
Publisher:
Editorial Universitat Politècnica de València
Publisher version: http://ocs.editorial.upv.es/index.php/AMPERE2019/AMPERE2019/paper/view/9757
Conference name: Ampere 2019
Conference place: Valencia, Spain
Conference date: Septiembre 09-12, 2019
Type: Capítulo de libro Comunicación en congreso

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