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Modelling and Study of a Microwave Plasma Source for High-rate Etching

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Modelling and Study of a Microwave Plasma Source for High-rate Etching

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Nombre: Pauly;Schulz;Walker ...
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dc.contributor.author Pauly, Steffen es_ES
dc.contributor.author Schulz, Andreas es_ES
dc.contributor.author Walker, Matthias es_ES
dc.contributor.author Gorath, K. es_ES
dc.contributor.author Baumgärtner, Klaus es_ES
dc.contributor.author Tovar, Günter es_ES
dc.date.accessioned 2019-11-04T08:35:09Z
dc.date.available 2019-11-04T08:35:09Z
dc.date.issued 2019-10-15
dc.identifier.isbn 9788490487198
dc.identifier.uri http://hdl.handle.net/10251/130169
dc.description.abstract [EN] The aim of this study is to investigate and to optimize an existing microwave-powered remote plasma source (RPS) with respect to the etching rate and gas temperature and to simplify the setup to save production costs. To achieve these goals, a FEM-based model of the RPS has been developed in order to investigate the microwave coupling into the plasma chamber and the microwave field distribution as well as the plasma itself. Different examples of FEM-based microwave simulations at different conditions and their experimental validations will be presented. es_ES
dc.format.extent 8 es_ES
dc.language Inglés es_ES
dc.publisher Editorial Universitat Politècnica de València es_ES
dc.relation.ispartof AMPERE 2019. 17th International Conference on Microwave and High Frequency Heating es_ES
dc.rights Reconocimiento - No comercial - Sin obra derivada (by-nc-nd) es_ES
dc.subject Energy Production by Microwaves es_ES
dc.subject Microwave CVD es_ES
dc.subject EM Modelling es_ES
dc.subject Microwave Material interaction es_ES
dc.subject Dielectric Properties es_ES
dc.subject Dielectric Properties Measurement es_ES
dc.subject Solid State Microwave es_ES
dc.subject Microwave Processing es_ES
dc.subject Microwave Chemistry es_ES
dc.subject Microwave applicators design es_ES
dc.subject Microwave plasma es_ES
dc.subject Remote plasma source es_ES
dc.subject Modeling es_ES
dc.subject Plasma etching es_ES
dc.title Modelling and Study of a Microwave Plasma Source for High-rate Etching es_ES
dc.type Capítulo de libro es_ES
dc.type Comunicación en congreso es_ES
dc.identifier.doi 10.4995/AMPERE2019.2019.9757
dc.rights.accessRights Abierto es_ES
dc.description.bibliographicCitation Pauly, S.; Schulz, A.; Walker, M.; Gorath, K.; Baumgärtner, K.; Tovar, G. (2019). Modelling and Study of a Microwave Plasma Source for High-rate Etching. En AMPERE 2019. 17th International Conference on Microwave and High Frequency Heating. Editorial Universitat Politècnica de València. 35-42. https://doi.org/10.4995/AMPERE2019.2019.9757 es_ES
dc.description.accrualMethod OCS es_ES
dc.relation.conferencename Ampere 2019 es_ES
dc.relation.conferencedate Septiembre 09-12, 2019 es_ES
dc.relation.conferenceplace Valencia, Spain es_ES
dc.relation.publisherversion http://ocs.editorial.upv.es/index.php/AMPERE2019/AMPERE2019/paper/view/9757 es_ES
dc.description.upvformatpinicio 35 es_ES
dc.description.upvformatpfin 42 es_ES
dc.type.version info:eu-repo/semantics/publishedVersion es_ES
dc.relation.pasarela OCS\9757 es_ES


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